Introduction to Microfabrication
John Wiley & Sons Ltd (Verlag)
978-0-470-85106-7 (ISBN)
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This book will serve as an excellent first text for electrical engineers, chemists, physicists and materials scientists who wish to learn about microstructures and microfabrication techniques, whether in MEMS, microelectronics or emerging applications.
Preface.Acknowledgements.PART I: INTRODUCTION.1. Introduction.2. Micrometrology and Materials Characterization.3. Simulation of Microfabrication Processes.PART II: MATERIALS .4. Silicon.5. Thin-Film Materials and Processes.6. Epitaxy.7. Thin-film Growth and Structure.PART III: BASIC PROCESSES.8. Pattern Generation.9. Optical Lithography.10. Lithographic Patterns.11. Etching.12. Wafer Cleaning and Surface Preparation.13. Thermal Oxidation.14. Diffusion.15. Ion Implantation.16. CMP: Chemical-Mechanical Polishing.17. Bonding and Layer Transfer.18. Molding and Stamping.PART IV: STRUCTURES.19. Self-aligned Structures.20. Plasma-etched Structures.21. Wet-etched Structures.22. Sacrificial Structures.23. Structures by Deposition.PART V: INTEGRATION.24. Process Integration.25. CMOS Transistor Fabrication.26. Bipolar Technology.27. Multilevel Metallization.28. MEMS Process Integration.29. Processing on Non-silicon Substrates.PART VI: TOOLS.30. Process for Microfabrication.31. Tools for Hot Process.32. Vacuum and Plasmas.33. Tools for CVD and Epitaxy.34. Integrated Processing.PART VII: MANUFACTURING.35. Cleanrooms.36. Yield.37. Wafer Fab.PART VIII: FUTURE.38. Moore's Law.39. Microfabrication at Large.Appendix A: Comments andA Hints to Selected Problems.Appendix B: Constants and Conversion Factors.Index.
Erscheint lt. Verlag | 20.4.2004 |
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Zusatzinfo | Illustrations |
Verlagsort | Chichester |
Sprache | englisch |
Maße | 189 x 247 mm |
Gewicht | 904 g |
Einbandart | Paperback |
Themenwelt | Technik ► Elektrotechnik / Energietechnik |
ISBN-10 | 0-470-85106-6 / 0470851066 |
ISBN-13 | 978-0-470-85106-7 / 9780470851067 |
Zustand | Neuware |
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